发明名称 |
Method of removing particle of photomask using atomic force microscope |
摘要 |
The kind of a particle is determined by pressing a hard atomic force microscope stylus having a spring constant equal to or larger than 300 N/m onto a particle to be removed and detecting bending quantity relative to a press force and a kind of a stylus used for removing the particle is changed in accordance with the kind of the particle.
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申请公布号 |
US7232995(B2) |
申请公布日期 |
2007.06.19 |
申请号 |
US20050185657 |
申请日期 |
2005.07.20 |
申请人 |
SII NANOTECHNOLOGY INC. |
发明人 |
TAKAOKA OSAMU;YASUTAKE MASATOSHI;WAKIYAMA SHIGERU;WATANABE NAOYA |
分类号 |
G21K7/00;G03F1/72;H01L21/027 |
主分类号 |
G21K7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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