发明名称 SPATTERING TARGET
摘要 A spattering target used when a thin- film is manufactured by spattering and a method of manufacturing the spattering target. The spattering target comprises backing plates and a bonding material layer for sticking them to each other. A spacer is not present in the bonding material layer, the thickness of the bonding material layer is within the range of 0.25 to 2 mm, and the sticking surface of the target and the sticking surfaces of the backing plates are substantially kept parallel with each other.
申请公布号 KR20070063050(A) 申请公布日期 2007.06.18
申请号 KR20077012162 申请日期 2007.05.29
申请人 MITSUI MINING & SMELTING CO., LTD. 发明人 ONO NAOKI
分类号 C23C14/34;H01J37/34 主分类号 C23C14/34
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