SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

A substrate processing apparatus and a substrate processing method are provided to remove contaminants from a substrate quickly and effectively. A substrate processing apparatus includes a pre-process unit, a freeze process unit, a post-process unit, and a transfer unit. The pre-process unit(2) is used for coating a pre-process solution on a substrate. The freeze process unit(4) is used for freezing the pre-process solution. The post-process unit(6) is used for removing the frozen pre-process solution from the substrate by supplying a post-process solution to the frozen pre-process solution. The transfer unit(12) is used for transferring the substrate between the process units.