发明名称 APPARATUS OF DEPOSITING BPSG
摘要 BPSG(BoroPhosphoSilicate Glass) deposition equipment is provided to prevent a BPSG layer from being excessively deposited by stopping the supply of a reaction gas into a reaction chamber in case of the generation of an abnormal BPSG deposition using a bus controller. BPSG deposition equipment includes a reaction chamber and a bus controller for controlling a CVD(Chemical Vapor Deposition) operation of the reaction chamber by comparing a reaction gas supply time with a reference time. The bus controller includes a main control part(200) for controlling the CVD operation of the reaction chamber according to a control algorithm, a timer(210) for setting a reference time according to the control of the main control part, an error detecting part(220) for detecting a malfunction of the reaction chamber by comparing the reaction gas supply time and the reference time, and a valve control part(230) for receiving an error generation signal from the error detecting part and breaking the supply of the reaction gas into the reaction chamber according to the error generation signal.
申请公布号 KR20070062829(A) 申请公布日期 2007.06.18
申请号 KR20050122676 申请日期 2005.12.13
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, HEE KYUN
分类号 H01L21/02;H01L21/205;H01L21/31 主分类号 H01L21/02
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