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发明名称
负型光阻剂
摘要
本发明之负型光阻剂主要系由高分子树脂(Resin)、感光起始剂(Photo initiator)、单体(Monomer)、溶剂(Solvent)所组成;亦可配合加入颜料(Pigment)、添加剂(Additives),俾获致一种尤适合搭配刮刀式涂布法(Slit Coating)应用在玻璃基板涂布的负型光阻剂。
申请公布号
TW200722921
申请公布日期
2007.06.16
申请号
TW094144395
申请日期
2005.12.15
申请人
新应材股份有限公司
发明人
郭光埌;戴伟仁;温世豪
分类号
G03F7/038(2006.01)
主分类号
G03F7/038(2006.01)
代理机构
代理人
主权项
地址
桃园县龙潭乡高原村渴望路185号1楼
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