| 摘要 |
A wafer detecting apparatus is provided to prevent the generation of malfunction due to the increase of temperature and to restrain the degradation of productivity by dissipating effectively the heat using a heat radiating unit with a plurality of protrusions. A wafer detecting apparatus includes a light emitting unit, a light receiving unit, a case, and a heat radiating unit. The light emitting unit(110) is used for emitting the light for detecting a wafer. The light receiving unit(120) is used for detecting the light emitted from the light emitting unit. The case(130) is used for enclosing the light emitting and receiving units. The heat radiating unit(140) is attached on at least one surface of the case. The heat radiating unit includes a plurality of protrusions.
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