发明名称 |
CONTROLLING ELECTROMECHANICAL BEHAVIOR OF STRUCTURES WITHIN A MICROELECTROMECHANICAL SYSTEMS DEVICE |
摘要 |
In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
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申请公布号 |
KR20070062584(A) |
申请公布日期 |
2007.06.15 |
申请号 |
KR20077009521 |
申请日期 |
2007.04.26 |
申请人 |
IDC, LLC |
发明人 |
MILES MARK W.;BATEY JOHN;CHUI CLARENCE;KOTHARI MANISH;TUNG MING HAU |
分类号 |
G02B26/00;B81B3/00;B81B7/00;H01L21/00 |
主分类号 |
G02B26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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