PROCEDE DE FABRICATION DE MASQUE LITHOGRAPHIQUE EN REFLEXION ET MASQUE ISSU DU PROCEDE

摘要

The invention relates to a process for fabricating an extreme ultraviolet photolithography mask operating in reflection, comprising a substrate, a mirror structure (uniformly deposited on the substrate, and an absorbent element forming a pattern deposited on the mirror structure, characterized in that the absorbent element is obtained by the irradiation and then development of an organometallic resist layer deposited on the mirror structure.