| 摘要 |
A deposition apparatus is provided to improve a quality of a film by using a chamber, a mask, a deposition source, and an auxiliary mask to guide a moving direction of deposition material. A mask(131) is disposed to deposit a desired film on a substrate(120) in a chamber, and has a first aperture(132a) of a predetermined pattern. A deposition source is installed in the chamber to supply deposition material onto the substrate. An auxiliary mask is interposed between the substrate and the mask to guide a moving direction of the deposition material. The auxiliary mask has a base with a second aperture corresponding to the first aperture, and a guide portion formed on the base. |
