ETCHING COMPOSITION FOR THIN-FILM TRANSISTOR LIQUID CRYSTAL DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an etching composition for a thin-film transistor liquid crystal display device. SOLUTION: The etching composition of this invention has the effect on etching an amorphous ITO comprising pixel electrodes of the thin-film transistor liquid crystal display device and an Mo/Al-Nd double film of a gate interconnection material constituting a thin film transistor (TFT) by a single process with the use of the same composition without an undercut phenomenon of the Al-Nd of a lower film to obtain an excellent taper, and at the same time, has also the effect on forming an excellent profile of an Mo single film of a source/drain interconnection material. COPYRIGHT: (C)2007,JPO&INPIT