| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which enhances solubility in resist preparation and resist film adhesion in development, improves resist stability and safety. <P>SOLUTION: The resist composition contains a resist component and an organic solvent, wherein the resist composition contains cyclohexanol acetate as the organic solvent. In the resist composition, two or more organic solvents may be combined. A combination of cyclohexanol acetate and cyclohexanol is a preferred combination of organic solvents. The resist composition may further contain at least one solvent selected from carboxylic acid alkyl esters, aliphatic ketones, glycol ethers and glycol ether acetates as an organic solvent. <P>COPYRIGHT: (C)2007,JPO&INPIT |
