PLASMA GENERATION METHOD AND DEVICE AND PLASMA TREATMENT DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method and a device in which electron temperature of plasma can be held down, in the plasma generation method and device generating inductively coupled plasma.

SOLUTION: The plasma generation method and device is provided with a plasma generating chamber 1, at least one high-frequency antenna 2 installed in the chamber 1, and a high-frequency power supply device (a power source 41 or the like) and generates inductively coupled plasma by impressing high-frequency power supplied from the high-frequency power supply device on gas in the chamber 1 through a high-frequency antenna 2. Also provided is a plasma treatment device utilizing the plasma generation device. The high-frequency antenna 2 has an impedance set at 45 Ω or less.

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