发明名称 |
METHOD AND SYSTEM FOR DOUBLE-SIDED PATTERNING OF SUBSTRATES |
摘要 |
The present invention is directed towards a method and a system of patterning first and second opposed sides of a substrate. The method and system may employ a mold assembly and obtaining a desired spatial relationship between the first and second opposed sides of the substrate and the mold assembly. In a further embodiment, the method and system may employ a first and a second mold assembly. |
申请公布号 |
WO2007067488(A2) |
申请公布日期 |
2007.06.14 |
申请号 |
WO2006US46256 |
申请日期 |
2006.11.30 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
CHOI, BYUNG-JIN;SREENIVASAN, SIDLGATA V. |
分类号 |
B29C35/02 |
主分类号 |
B29C35/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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