| 摘要 |
PROBLEM TO BE SOLVED: To surely prevent the diffusion or back diffusion of a process atmosphere in a vacuum treatment chamber into a neighbored conveyor room side when a gate value is opened to carry a body to be treated into or out of the vacuum treatment chamber. SOLUTION: In the vacuum treatment device, when the gate valve GA is brought into an opened state, only a circumference local exhaust port 46 positioned at the foot of the gate valve GB is operated to exhaust in the vacuum conveyance room 10. Accordingly, gas flows from every place in the vacuum conveyance room 10 toward the gate valve GA or the neighborhood of the circumference local exhaust port 46. By such local exhausting, when the conveyor arm of a vacuum conveyance robot RB<SB>1</SB>or a wafer W is passed through the gate valve GA, the possibility of entering the process atmosphere in the vacuum treatment chamber 12 into the vacuum conveyance room 10 is extremely low. Even though the process atmosphere has entered the chamber, for example, the atmosphere is forcibly enclosed into the circumference local exhaust port 46 positioned immediately below and discharged quickly therefrom. COPYRIGHT: (C)2007,JPO&INPIT |
