发明名称 |
Positive resist composition and pattern making method using the same |
摘要 |
A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit of a specific structure and being stable to acids but insoluble in an alkali developer; and (D) a solvent; and a pattern making method using the same.
|
申请公布号 |
US2007134590(A1) |
申请公布日期 |
2007.06.14 |
申请号 |
US20060636633 |
申请日期 |
2006.12.11 |
申请人 |
FUJIFILM CORPORATION. |
发明人 |
FUKUHARA TOSHIAKI;KANNA SHINICHI;KANDA HIROMI |
分类号 |
G03C1/00 |
主分类号 |
G03C1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|