| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask that can accurately control a focus at a desired position within the photomask face in a transfer simulation of a photomask using a lithographic simulation microscope, and to provide a transfer simulation method on a photomask. <P>SOLUTION: A main pattern of a photomask having a focus monitor mark capable of controlling a focus position can be subjected to a transfer simulation giving a just-focus and accurate contrast of transmitted light intensity, only by setting a focus controlling system 80 on a measurement stage of a lithographic simulation microscope, the system capable of giving a just-focus and accurate contrast of transmitted light intensity. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
