发明名称 ELECTRODE APPARATUS FOR PLASMA DISCHARGE
摘要 <p><P>PROBLEM TO BE SOLVED: To further improve the gas treatment efficiency of an electrode apparatus for plasma discharge, in which non-equilibrium plasma is generated to treat a gas. <P>SOLUTION: The electrode apparatus 6 for plasma discharge, in which non-equilibrium plasma is generated to treat the gas, is provided with: a substrate 11 composed of a dielectric; an electrode 4 buried in the substrate 11; a catalyst 7 deposited on the substrate 11 for promoting reaction of the gas; and a secondary electron emitting agent 8 deposited on the substrate 11. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007144360(A) 申请公布日期 2007.06.14
申请号 JP20050345075 申请日期 2005.11.30
申请人 NGK INSULATORS LTD 发明人 TAKAHASHI MICHIO;SUZUKI JUNICHI
分类号 B01J19/08;B01D53/56;B01D53/74 主分类号 B01J19/08
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