| 摘要 |
PROBLEM TO BE SOLVED: To provide a mold with high releasing properties with a photo-curable resin, and excellent in durability. SOLUTION: A quartz substrate 15 having ultraviolet light-permeable properties is coated with an electron beam resist 17. In this case, it is irradiated with an electron beam to form a resist pattern 17a. Thereafter, dry etching is applied on the quartz substrate 15 by using an etching gas such as tetrafluorocarbon to form a pattern 15a on the quartz substrate 15. Then, on the face of the quartz substrate 15 which has the pattern 15a, a photo-catalytic titanium oxide film 11 is formed by sputtering or the like to prepare the mold 10 for NIL. COPYRIGHT: (C)2007,JPO&INPIT
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