发明名称 Gas barrier
摘要 Nanoparticles of amorphous aluminum oxynitride or silicon oxynitride having a very high aspect ratio are used to fill polymeric materials to provide products that have an extremely low WVTR/OTR. Such products are particularly effective for incorporation into organic light-emitting devices or the like which are susceptible to degradation from moisture and/or oxygen. Pressure sensitive and/or thermosetting adhesives filled with such particles create excellent sealants. Polymeric sheets or films made from resin in which these nanoparticles are dispersed, or intimately associated with, before extrusion exhibit very low WVTR/OTR.
申请公布号 US2007135552(A1) 申请公布日期 2007.06.14
申请号 US20050298916 申请日期 2005.12.09
申请人 GENERAL ATOMICS 发明人 WROSCH MATTHEW B.;KLEIN ANDRE R.
分类号 C08K3/34 主分类号 C08K3/34
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