发明名称 POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION
摘要 <p>Disclosed is a polysiloxane having a structural unit represented by the general formula (III) or general formula (IV) below, which is obtained by polycondensating a silane compound represented by the general formula (I) or general formula (II) below in the presence of water. Also disclosed is a radiation-sensitive resin composition containing such a polysiloxane and a radiation-sensitive acid generator. (In the formulae, R&lt;SUP&gt;1&lt;/SUP&gt;, R&lt;SUP&gt;2&lt;/SUP&gt;, R&lt;SUP&gt;3&lt;/SUP&gt; and R&lt;SUP&gt;4&lt;/SUP&gt; are as defined in the description.)</p>
申请公布号 WO2007066653(A1) 申请公布日期 2007.06.14
申请号 WO2006JP324249 申请日期 2006.12.05
申请人 JSR CORPORATION;NISHIMURA, ISAO;SUGIE, NORIHIKO;NATSUME, NORIHIRO;TAKAHASHI, JUNICHI 发明人 NISHIMURA, ISAO;SUGIE, NORIHIKO;NATSUME, NORIHIRO;TAKAHASHI, JUNICHI
分类号 C08G77/12;G03F7/039;G03F7/075;H01L21/027 主分类号 C08G77/12
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