发明名称 |
POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION |
摘要 |
<p>Disclosed is a polysiloxane having a structural unit represented by the general formula (III) or general formula (IV) below, which is obtained by polycondensating a silane compound represented by the general formula (I) or general formula (II) below in the presence of water. Also disclosed is a radiation-sensitive resin composition containing such a polysiloxane and a radiation-sensitive acid generator. (In the formulae, R<SUP>1</SUP>, R<SUP>2</SUP>, R<SUP>3</SUP> and R<SUP>4</SUP> are as defined in the description.)</p> |
申请公布号 |
WO2007066653(A1) |
申请公布日期 |
2007.06.14 |
申请号 |
WO2006JP324249 |
申请日期 |
2006.12.05 |
申请人 |
JSR CORPORATION;NISHIMURA, ISAO;SUGIE, NORIHIKO;NATSUME, NORIHIRO;TAKAHASHI, JUNICHI |
发明人 |
NISHIMURA, ISAO;SUGIE, NORIHIKO;NATSUME, NORIHIRO;TAKAHASHI, JUNICHI |
分类号 |
C08G77/12;G03F7/039;G03F7/075;H01L21/027 |
主分类号 |
C08G77/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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