发明名称 POLISHING FLUID FOR POLISHING ORGANIC FILM, AND METHOD FOR POLISHING ORGANIC FILM USING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a polishing fluid for polishing an organic film, which polishing fluid can make a film thickness uniform within a pixel, and further can efficiently eliminate a film thickness difference, and is suitable for polishing a color filter for a liquid crystal display, and further to provide a method for polishing the film made of an organic material (organic film) using the same polishing fluid. <P>SOLUTION: The polishing fluid for polishing the organic film is produced by dispersing abrasive grains in water such that the concentration of the abrasive grains in the polishing fluid is 3 wt.% or less. The organic film is polished by pressing a base plate, which has the organic film to be polished thereon, against the polishing cloth on a polishing surface plate, and by relatively moving the base plate and the polishing surface plate while supplying the polishing fluid between the organic film and the polishing cloth. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007144612(A) 申请公布日期 2007.06.14
申请号 JP20060289025 申请日期 2006.10.24
申请人 HITACHI CHEM CO LTD 发明人 ONO YUTAKA;KAMIGATA YASUO;UEDA SHUNSUKE;ASHIZAWA TORANOSUKE
分类号 B24B37/00;C09K3/14 主分类号 B24B37/00
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