PROCESSING APPARATUS FOR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a processing apparatus which washing a substrate without damaging it by preventing the temperature of processing liquid given ultrasonic vibrations from rising. SOLUTION: The processing apparatus for substrate which processes the substrate with the processing liquid given ultrasonic vibrations is equipped with an oscillation body 32, which is a rectangular parallelepiped and has an opening on a reverse surface of one length-directional end, and a supply path 35 for processing liquid formed obliquely to the other length-directional end part; a vibrator 34 which vibrates the oscillation body provided on the top surface of the oscillation body with an ultrasonic wave; and a heat exchanger which cools the processing liquid supplied to the supply path. COPYRIGHT: (C)2007,JPO&INPIT