发明名称 PATTERN FORMATION METHOD AND DROPLET DISCHARGE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a pattern formation method for improving the shape controllability of patterns formed of droplets by maintaining precision of the landing positions of the discharged droplets and precision of the irradiation position of laser light, and a droplet discharge device therefor. SOLUTION: A turn stage 29 which turns by using a landing position PF as a turning axis is provided in the side of a substrate 2 of a carriage 27. A discharge head 32 and a laser head 37 are disposed on the turn stage 29. The landing position PF is arranged to be positioned in the formation direction (discharge direction A1) of each nozzle N and the direction of the light axis (irradiation direction A2) of an irradiation opening 38. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007144999(A) 申请公布日期 2007.06.14
申请号 JP20060276856 申请日期 2006.10.10
申请人 SEIKO EPSON CORP 发明人 IWATA YUJI
分类号 B41J2/01;B05C5/00;B05C9/12;G02F1/13 主分类号 B41J2/01
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