| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an antireflection film which has low reflectivity and high transmissivity, is excellent in durability and an antistatic characteristic, and suppresses generation of discharge, with high productivity and at a low cost, and also to provide a display apparatus. <P>SOLUTION: The method for manufacturing the antireflection film 1 has processes of: forming a 1st oxide layer 21 which consists essentially of tin oxide and silicon dioxide and in which a ratio of tin to silicon is within a specific range on a base material 10; forming a 2nd oxide layer 22 which consists essentially of gallium oxide, indium oxide and tin oxide and in which a ratio between gallium, indium and tin is within a specific range or a 2nd oxide layer 22 which consists essentially of tin oxide on the 1st oxide layer 21; and forming a 3rd oxide layer 23 consisting essentially of silicon dioxide by a wet coating method on the 2nd oxide layer 22. <P>COPYRIGHT: (C)2007,JPO&INPIT |
