发明名称 EXPOSURE METHOD AND EXPOSURE DEVICE
摘要 <p>It is possible to provide an exposure device and an exposure method capable of accurately applying optical energy into a predetermined range. By adjusting the difference between the inner and the outer air pressure of a case (111), it is possible to adjust the curved deformation amount of a photo mask (2) mounted on the opening of the case (111) caused by the air difference and further adjust the curved deformation amount so as to adjust the angle between the surface of the photo mask (2) and the irradiation plane of the substrate (3), thereby adjusting the dimension of the irradiation arrange of the optical energy applied to the irradiation surface of the substrate (3) via a light transmitting unit (22) formed on the photo mask (2).</p>
申请公布号 WO2007066596(A1) 申请公布日期 2007.06.14
申请号 WO2006JP324083 申请日期 2006.12.01
申请人 SHARP KABUSHIKI KAISHA;TANIGUCHI, HIDEO;YAMADA, SHIGEYUKI;OKETANI, TAIMI 发明人 TANIGUCHI, HIDEO;YAMADA, SHIGEYUKI;OKETANI, TAIMI
分类号 G03F7/20 主分类号 G03F7/20
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