POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD FOR FORMING RESIST PATTERN

摘要

Disclosed is a positive resist composition for immersion exposure containing a resin component (A) having an acid-cleavable dissolution inhibiting group, and an acid generator component (B) which generates an acid when exposed to light. The alkali solubility of the resin component (A) is increased by the action of an acid. The positive resist composition for immersion exposure is characterized in that the resin component (A) contains a cyclic main chain polymer (A1) and a noncyclic main chain polymer (A2) which has a constitutional unit (a) derived from an acrylic acid as the main chain.