| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing fluid supply apparatus capable of improving uniformity in the surface of an object to be polished, and reducing the amount of consumption of polishing fluid, and to provide a polishing member and the polishing fluid supply apparatus having the polishing member. SOLUTION: An electrolyte inlet I is provided in a range nearly at the center of the upper surface of the electrolyte supply apparatus 60, an electrolyte travel path M is provided inside the electrolyte supply apparatus 60, ribs 67c (ribs 67e, 67f in a radial direction and ribs 67g, 67h in a tangential direction) for adjusting the flow of an electrolyte E are provided in the electrolyte travel path M, a through-hole for limiting the inflow of the electrolyte E is provided at the bottom of the electrolyte storage F, and the electrolyte E is injected from the electrolyte inlet I to the electrolyte supply apparatus 60 for supplying from the lower side to the upper side of a polishing member layer 62 via the electrolyte travel path M and the electrolyte storage F. COPYRIGHT: (C)2007,JPO&INPIT |
