发明名称 METHOD FOR MANUFACTURING SUBSTRATE HAVING THIN-FILM PATTERN LAYER
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate comprising a thin-film pattern layer. SOLUTION: This method for manufacturing a substrate comprising a thin-film pattern layer comprises the step of providing a preformed substrate comprising a plurality of ink-repellent partition walls, a housing space being provided between adjacent partition walls, the step of delivering an ink containing a solidifiable component into the plurality of housing spaces, the volume of ink received each of the housing spaces being larger than the volume of the housing space, and the step of solidifying the ink and forming a thin-film pattern layer, by the solidifiable component in the ink, in the housing space. Since the height of the thin-film pattern layer is substantially equal to that of the partition wall, there is no need to polish the partition wall and the thin-film pattern layer by polishing and etching and a demand for high evenness can be satisfied. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007144418(A) 申请公布日期 2007.06.14
申请号 JP20060317698 申请日期 2006.11.24
申请人 ICF TECHNOLOGY CO LTD 发明人 WANG YU-NING;KYO ENKEI;CHOU CHING-YU
分类号 B05D3/00;B05D1/26;G09F9/00 主分类号 B05D3/00
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