| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method capable of stably manufacturing thermal infrared detecting elements and array elements, even for a structure that is simpler than those of prior art. <P>SOLUTION: When a concave portion 8 is formed in a substrate 7 by an etching gas, it is necessary that an etching stopper be formed in the substrate 7, because etching of silicon is performed isotropally. In the present invention, however, since wet crystalline anisotropy treatment is performed, etching stoppers become unnecessary. Moreover, by adding a fixing member for supporting an infrared absorber 2 prior to the treatment, possible sticking during the drying period after the wet treatment can be prevented. Finally, the fixing member added is removed by dry processing. Accordingly, thermal infrared detecting elements 1 can be manufactured stably. <P>COPYRIGHT: (C)2007,JPO&INPIT |
