发明名称 DMOS transistor with optimized periphery structure
摘要 A lateral DMOS transistor is disclosed that includes a first region of a first conductivity type, which is surrounded on the sides by a second region of a second conductivity type, whereby a boundary line between both regions has opposite straight sections and curved sections linking the straight sections, and with a first dielectric structure, which serves as a field region and is embedded in the first region and surrounds a subregion of the first region. Whereby the first distance between the first dielectric structure and the boundary line is greater along the straight sections than along the curved sections.
申请公布号 US2007132019(A1) 申请公布日期 2007.06.14
申请号 US20060636668 申请日期 2006.12.11
申请人 ATMEL GERMANY GMBH 发明人 DIETZ FRANZ;GRAF MICHAEL;SCHWANTES STEFAN
分类号 H01L29/76 主分类号 H01L29/76
代理机构 代理人
主权项
地址
您可能感兴趣的专利