METHOD FOR THE DEPOSITION OF A VAPORIZING MATERIAL

摘要

The invention relates to a method for depositing a vaporizing material on a basic material, especially in order to dope a semiconductor material. According to said method, a vaporizing charge (1) in which a certain amount (2) of the charge of vaporizing material is airtightly enclosed by means of an envelope (3) is introduced into a vaporizing chamber, and the envelope (3) is opened by heating and/or reducing the pressure in the vaporizing chamber such that the vaporizing material subsequently evaporates in the vaporizing chamber and is deposited on the basic material. The invention further relates to a vaporizing charge (1) as well as a method for producing said vaporizing charge (1).