发明名称 PATTERN FORMING METHOD AND DROPLET DISCHARGE DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a pattern forming method and a droplet discharge device capable of changing an irradiation angle of a laser beam by maintaining the positional precision of the beam to irradiate droplets. <P>SOLUTION: A carriage 27 is provided with a turning stage 35 turning on a target irradiation position PT on the substrate 2 side with a laser head 37 on the turning stage 35 disposed. When the arrangement of the turning stage 35 is shifted from a reference position to an irradiation position, each of irradiation ports 37a of the laser head 37 is turned around the target irradiation position PT corresponding thereto, so as to reduce the irradiation angleθof the laser beam B by the turning angleθr of the turning stage 35. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007144400(A) 申请公布日期 2007.06.14
申请号 JP20060276855 申请日期 2006.10.10
申请人 SEIKO EPSON CORP 发明人 IWATA YUJI
分类号 B05D3/00;B05C5/00;B05C9/14;B05D1/26;B05D3/06;B23K26/04;B41J2/01;G02F1/13;G09F9/00 主分类号 B05D3/00
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