发明名称 METHOD FOR PROCESSING SUBSTRATE, AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method for sticking a protective substrate suitably by removing bubbles from the stage of resin coating process. SOLUTION: The method for processing the other side of a substrate (10) having one side provided with a plurality of structures (36) comprises a first step for coating one side of the substrate (10) with adhesive (400), a second step for applying a negative pressure and a positive pressure sequentially to the adhesive, a third step for arranging a protective substrate (420) on the adhesive, a fourth step for processing the other side of the substrate, and a fifth step for stripping the protective substrate (420) from the substrate. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007144799(A) 申请公布日期 2007.06.14
申请号 JP20050342586 申请日期 2005.11.28
申请人 SEIKO EPSON CORP 发明人 FUJIMORI OSAMU;MATSUO TAKEHIDE
分类号 B41J2/16;B41J2/045;B41J2/055 主分类号 B41J2/16
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