In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range and increase a bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is above the predetermined bandwidth range. In another aspect an active bandwidth control system may include an optic for altering a wavefront of a laser beam in a laser cavity of the laser source to selectively adjust an output laser bandwidth in response to the control signal. In yet another aspect, the bandwidth of a laser having a wavelength variation across an aperture may be actively controlled by an aperture blocking element that is moveable to adjust a size of the aperture.
申请公布号
WO2007005511(A3)
申请公布日期
2007.06.14
申请号
WO2006US25349
申请日期
2006.06.28
申请人
CYMER, INC.;REILEY, DANIEL, J.;RYLOV, GERMAN, E.;BERGSTEDT, ROBERT, A.
发明人
REILEY, DANIEL, J.;RYLOV, GERMAN, E.;BERGSTEDT, ROBERT, A.