Lithographic apparatus and device manufacturing method
摘要
Apparatus and methods for compensating for the movement of a substrate (W) in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror (10) configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.
申请公布号
EP1795966(A1)
申请公布日期
2007.06.13
申请号
EP20060256076
申请日期
2006.11.28
申请人
ASML NETHERLANDS BV;ASML HOLDING N.V.
发明人
VISSER, HUIBERT;CALLAN, DAVID WILLIAM;MUNNIG SCHMIDT, ROBERT-HAN;WIENER, ROBERTO;VAN DE VEN, JOHANNES, T. G.;ROBBINS, GEORGE HOWARD