摘要 |
A mask layout is provided to restrain the non-uniformity of middle cells of a middle cell array on a chip and to prevent the failure of a middle sense amplifier and a sub word line by forming an assist cell array between the middle sense amplifier and the middle cell array. A mask layout(100) includes a middle cell array(A) and a normal cell array. The middle cell array is defined by the cross between a middle sense amplifier(120) and a sub word line(110). The normal cell array is defined by the cross between a normal sense amplifier and the sub word line. An assist cell array(140) is formed at a portion between the middle sensor amplifier and the middle cell array. The assist cell array is formed by the extension of the middle cell array.
|