发明名称 LAYOUT OF MASK
摘要 A mask layout is provided to restrain the non-uniformity of middle cells of a middle cell array on a chip and to prevent the failure of a middle sense amplifier and a sub word line by forming an assist cell array between the middle sense amplifier and the middle cell array. A mask layout(100) includes a middle cell array(A) and a normal cell array. The middle cell array is defined by the cross between a middle sense amplifier(120) and a sub word line(110). The normal cell array is defined by the cross between a normal sense amplifier and the sub word line. An assist cell array(140) is formed at a portion between the middle sensor amplifier and the middle cell array. The assist cell array is formed by the extension of the middle cell array.
申请公布号 KR20070060343(A) 申请公布日期 2007.06.13
申请号 KR20050119650 申请日期 2005.12.08
申请人 HYNIX SEMICONDUCTOR INC. 发明人 OH, SE YOUNG
分类号 H01L21/027 主分类号 H01L21/027
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