Method and system for transporting substrate wafers

摘要

A transport system for transporting substrate wafer, for making semiconductor integrated circuits and liquid crystal display panels and the like advanced devices, is presented and methods of using the system are demonstrated with examples. The object is to prevent surface degradation which may be inflicted on the surface to interfere with proper processing of the substrate so as to improve the processing yield. The substrate wafers are delivered to process chambers always in clean surface conditions. A method illustrated utilizes a purge gas containing an inert gas or a mixture of an inert gas and oxygen for flowing inside the tunnel space, and a semiconductor laser detection system to detect the contamination levels within the tunnel space, and the transport parameters are controlled according to the measured data.