PRODUCTION METHOD OF PHOTO LITHOGRAPHY BY SELF-ASSEMBLING, THE CIRCUIT BY THIS METHOD, AND APPLICATION OF THE CIRCUIT

摘要

A method for forming a lithography circuit, the circuit manufactured thereby and the application of the circuit are provided to reduce material costs, to decrease a processing time, to improve thin film characteristics and to control easily electric conductivity by performing a photolithography using a self-assembly process. A photosensitive inorganic oxidant is coated on a base member. A first circuit is formed on the resultant structure by irradiating selectively UV(UltraViolet) rays or visible rays through a photomask. The resultant structure contacts a gas phase monomer, so that a polymer thin film is selectively formed on the resultant structure. A cleaning process is performed on the resultant structure in order to remove undesired materials therefrom.