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发明名称
半导体制造用的处理腔
摘要
申请公布号
CN3657816D
申请公布日期
2007.06.13
申请号
CN200630134716.7
申请日期
2006.08.08
申请人
东京毅力科创株式会社
发明人
金子裕史
分类号
23-03
主分类号
23-03
代理机构
北京纪凯知识产权代理有限公司
代理人
龙 淳
主权项
地址
日本东京
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