| 摘要 |
A mask for forming an electroluminescent layer is provided to reduce a shadow region in which a deposition layer is not formed in a deposition layer forming region on a surface of a substrate. A distance(L1) of a pattern(m1) most adjacent to a rotation center or at a center of a substrate(2) is shorter than a distance(L2) of a pattern(m2) formed outward on a mask(M1). The distances of the patterns are gradually increased from the center to an outside. The distance of the pattern most adjacent to the rotation center or at a center of the substrate is equal to a distance of a deposition layer forming region(D) to reduce a distance of a deposition layer(N1) formed on an unnecessary region. |
