发明名称 Chemical vapor deposition of fluorocarbon polymer thin films
摘要 <p>Provided are methods for forming a fluorocarbon polymer thin film on the surface of a structure. In one method, a monomer gas, preferably hexafluoropropylene oxide is exposed to a source of heat having a temperature sufficient to pyrolyze the monomer gas and produce a source of reactive CF 2 species in the vicinity of the structure surface. The structure surface is maintained substantially at a temperature lower than that of the heat source to induce deposition and polymerization of the CF 2 species on the structure surface. In another method a pulsed plasma is used to produce reactive CF 2 species. The monomer gas pyrolysis and plasma excitation methods can be carried out individually, sequentially, or simultaneously. Flexible thin films can be produced on wires, twisted wires, neural probes, tubing, complex microstructures, substrates, microfabricated circuits, and other structures. The films have a compositional CF 2 fraction of at least about 50 %, a dielectric constant of less than about 1.95, and a cross-linking density of less than about 35 %.</p>
申请公布号 EP1795626(A1) 申请公布日期 2007.06.13
申请号 EP20050024472 申请日期 1997.05.05
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY 发明人 EDELL, DAVID J.;GLEASON, EDWARD F.;GLEASON KAREN K.;LIMB, SCOTT J.H.;SAWIN, HERBERT H.
分类号 C23C16/00;B05D7/24;C08F2/46;C08F14/18;C23C16/44;C23C16/46;C23C16/50;C23C16/515;H01L21/312;H01L23/532 主分类号 C23C16/00
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