MAGNETRON SPUTTER ELECTRODE AND SPUTTERING APPARUTUS USING THE MAGNETRON SPUTTER ELECTRODE

摘要

A magnetron sputter electrode and a sputtering apparatus using the same are provided to adjust easily a tunnel-shaped magnetic flux profile generated between a magnet assembly and a magnet. A magnetron sputter electrode includes a target(41) and a magnet assembly installed at a backside of the target. The magnet assembly is formed by arranging a central magnet(52) and a peripheral magnet on a supporting plate(51) for forming tunnel-shaped magnetic flux in front of the target. The supporting plate including the central magnet and the peripheral magnet is divided into both facing sides. A position change unit fixes a center part of the divided facing sides on a base plate(54).