发明名称 |
Positive resist composition and pattern making method using the same |
摘要 |
A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit of a specific structure and being stable to acids but insoluble in an alkali developer; and (D) a solvent; and a pattern making method using the same. |
申请公布号 |
EP1795961(A1) |
申请公布日期 |
2007.06.13 |
申请号 |
EP20060025354 |
申请日期 |
2006.12.07 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
FUKUHARA, TOSHIAKI;KANNA, SHINICHI;KANDA, HIROMI |
分类号 |
G03F7/039;G03F7/004;G03F7/075;G03F7/20 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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