WAFER MANUFACTURING APPARATUS FOR HIGH-TEMPERATUER PROCESS

摘要

A wafer manufacturing apparatus for high-temperature process is provided to minimize a pitch and enhance productivity by forming a holder for receiving a working space of an end effector. A holder(30) supports a bottom part of a semiconductor substrate(100) by using a circular rim thereof. The holder elevates an end effector using a top-edge-grip method and includes a grip working space. The holder includes a working space for gripping the end effector. A boat has a pitch to avoid interference with the holder. A gas sealing unit seals up a gap between a manifold body(34) and a reaction tube(36) heated by high temperature by using inert gas.