发明名称 |
METHOD OF FABRICATING DISPLAY SUBSTRATE AND METHOD OF FABRICATING LCD THEREOF |
摘要 |
A method for manufacturing a display substrate, and a method for manufacturing an LCD(Liquid Crystal Display) by using the same are provided to form a photoresist layer pattern having a uniform thickness along an inclined portion of an etched layer pattern by applying reflow to the photoresist layer pattern when the photoresist pattern is formed on the etched layer pattern having an inclined edge portion. A first etched-layer pattern(2) having an inclined edge portion is formed on a substrate(1). A second etched layer covering the first etched layer pattern is formed. A first photoresist layer pattern(4) is formed on the second etched layer, and has a first thickness(t1) in a first region including a portion where the first etched-layer pattern is formed, and a second thickness(t2) in a second region spaced apart form the first region. The first photoresist layer pattern is inclined uniformly along the edge portion of the first etched-layer pattern. The second etched layer is patterned to form a second etched-layer pattern(3). |
申请公布号 |
KR20070060290(A) |
申请公布日期 |
2007.06.13 |
申请号 |
KR20050119542 |
申请日期 |
2005.12.08 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUNG, DOO HEE;PARK, JEONG MIN;LEE, HI KUK |
分类号 |
G02F1/136 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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