CHEMICAL SUPPLYING SYSTEM FOR SEMICONDUCTOR MANUFACTURING

摘要

A chemical supply apparatus for fabricating a semiconductor device is provided to uniformly control the flow of chemicals introduced into a bath for a cleaning process or a wet etch process for fabricating a semiconductor by installing a shutter in a hole formed in a chemical supply pipe through which the chemicals are introduced into the bath. A plurality of wafers(10) for fabricating a semiconductor device are erectly received in a wafer support part(20). The wafer and the wafer support part are surrounded by a rectangular bath(30) whose upper part is open. A gutter part(40) is formed on the outer part of the bath along the upper part of the sidewall of the bath. A chemical introduction pipe of a ling tube shape is formed in the bath wherein a plurality of holes are formed in the chemical introduction pipe. The chemical introduction pipe can be installed in the plurality of holes. The chemical introduction pipe can be installed in the lower part of the inside of the bath.