| 摘要 |
<p>A coating method of a photoresist material is provided to form a photoresist layer of desired thickness even while using a small amount of a photoresist material by distributing a thinner on a stationary substrate and then spraying the photoresist material on the stationary substrate with rotating the substrate, save process expenses, and improve productivity. The coating method of a photoresist material comprises the steps of: mounting a substrate(130) on a spin chuck of a spin coater; spraying a thinner(140) on the stationary substrate(130) for a first time; rotating the substrate(130) at a first speed for a second time shorter than the first time to disperse the sprayed thinner(140); spraying a photoresist material(150) on the substrate(130) rotating at the second speed faster than the first speed so as to coat the substrate(130) with the photoresist material(150); and reducing the substrate(130) to a third speed slower than the first speed to stabilize the coated photoresist material(150).</p> |
