| 摘要 |
Methods, systems, and articles of manufacture consistent with the present invention identify a flaw in a structure by comparing a first interference pattern resulting from a first wave signal and a second wave signal propagating through the structure to a second interference pattern resulting from the first wave signal and the second wave signal propagating through the structure. The second interference pattern is obtained after obtaining the first interference pattern. It is determined whether there is a flaw in the structure by determining whether the first interference pattern deviates from the second interference pattern by a predetermined variance.
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