NEAR-FIELD OPTICAL PROBE BASED ON SILICON NITRIDE LAYER AND FABRICATION METHOD THEREOF

摘要

A near-field optical probe based on a silicon nitride layer and a fabricating method therefor are provided to easily combine a fabricating process of a tip in which an aperture is formed and a fabricating process of a cantilever arm including the tip and easily adjust an aperture size of a tip upper part. A cantilever arm supporting part(42) is formed as a single silicon substrate(10) which has a hole at one side of a body. A cantilever arm(44) includes a silicon nitride layer(30) and a metal layer(38). The silicon nitride layer(30) is supported to an upper surface of the silicon substrate(10). The silicon nitride layer(30), in which stress is reduced, has a tip corresponding to the hole. The metal layer(38) is formed on the silicon nitride layer(30). An aperture is formed on the tip of the cantilever arm(44).