MAGNETIC INDUCTION DEVICE FOR METAL TARGET OF ION PLATING APPARATUS

摘要

A magnetic induction device for a metal target of an ion plating equipment is provided to reduce the manufacturing cost by enabling the entire metal target to be uniformly evaporated such that utilization efficiency of the metal target is increased, and improve coating efficiency of matrices by uniformly maintaining metal ions in a larger region. A magnetic induction device(100) for a metal target of an ion plating equipment comprises: a rectangular fixed plate(110) connected to one face of the metal target; and a magnetic induction line(120) for forming a magnetic field when an electric current is applied to the magnetic induction line from the outside, wherein the magnetic induction line comprises first and second magnetic induction wires(121,123), and is fixed to an inner side of the fixed plate. The fixed plate comprises a fixed rim(111) of which an edge portion is protruded, and first and second cores(113,115) which are projectingly formed at an inner side of the fixed rim, and to which the first and second magnetic induction wires are fixed respectively. The second core has through holes(115a) formed therein such that a cooling pipe is inserted into the through holes to prevent the metal target and the fixed plate from being heated during arc discharge. The fixed rim of the fixed plate has a plurality of clamping holes(111a) formed therein such that bolts are clamped to the clamping holes when fixing the fixed plate to the metal target.